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タイトル :Extreme ultraviolet radiation from Z-pinch plasmas for next generation lithography
著者 :Akiyama, Hidenori
Katsuki, Sunao
Namihira, Takao
Sakugawa, Takashi
Imamura, Hideki
刊行年月日 :2006-5-14
収録雑誌名 :Conference Record of the International Power Modulator Symposium and High Voltage Workshop
巻 :2006
開始ページ :356
終了ページ :359
要約(Abstract) :Development of the high power EUV (extreme ultraviolet) source has been expected as a light source for the next generation lithography. There are two kinds of EUV sources: the discharge produced plasma (DPP) and the laser produced plasma (LPP). The DPP method is considered to be promising in easiness of radiating the high power EUV and in the cheapness of constructing the EUV source. The Z- pinch plasmas driven by pulsed power have been used mainly in the DPP method. Here, the research results of the DPP method at Kumamoto University are summarized.
URL :http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=4216210&abstractAccess=no&userType=inst
収録種別 :会議発表論文
出版社(者) :Institute of Electrical and Electronics Engineers
権利(Rights) :(c)2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
備考 :Power Modulator Symposium, 2006. Conference Record of the 2006 Twenty-Seventh International , 14-18 May 2006
URI :http://hdl.handle.net/2298/16071
このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/2298/16071