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タイトル :Novel Dual Marx Generator for Microplasma Applications
著者 :Heeren, Tammo
Ueno, Takahisa
Wang, Douyan
Namihira, Takao
Katsuki, Sunao
Akiyama, Hidenori
刊行年月日 :2005-8
収録雑誌名 :IEEE TRANSACTIONS ON PLASMA SCIENCE
巻 :33
号 :4
開始ページ :1205
終了ページ :1209
要約(Abstract) :Micrometer size plasmas, or microplasmas, find applications in pollution control, reduction, and prevention. The required nonthermal plasmas can be generated by either an electron beam or an electric discharge. The pulse widths and voltages necessary to generate these nonthermal plasmas are$10 ^-10$–$10 ^-8~ s$, and$10 ^3$–$10 ^4~ V$, respectively, depending on the application. The required energy is typically in the low$10 ^-3~ J$range. This paper presents a novel circuit design to generate high-voltage pulses with variable pulse widths and pulse rise and fall times in the low$10 ^-9~ s$regime. The circuit employs two parallel Marx Generators utilizing bipolar junction transistors (BJTs) as closing switches. The BJTs are operated in the avalanche mode to yield fast rise times. The design allows for positive or negative polarity pulses, and can easily be changed to yield higher or lower output voltage.
収録種別 :雑誌掲載論文
出版社(者) :Institute of Electrical and Electronics Engineers
権利(Rights) :c2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. IEEE, IEEE TRANSACTIONS ON PLASMA SCIENCE, 33, 4, 2005, 1205-1209
URI :http://hdl.handle.net/2298/3495
出現コレクション:発表論文(工学系)
このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/2298/3495

 

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